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Eutectic Die Attach Temperature
Eutectic Die Attach
is a process for mounting the die on its die pad using a preform that
forms a eutectic alloy with the die at a certain elevated temperature.
The eutectic alloy formed serves as the die attach material that bonds
the die to the die pad. Below is a thread discussing the
temperature at which the eutectic die attach process in question needs
to be done.
Posted by IkingJr: Wed
Jun 16, 2004 8:27 am Post
subject: Eutectic Temperature for various die back
metallizations |
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Hello EE;
Our team is confused, we recently did a eutectic die
attach (die back - 100 wt %) on one of our package using
ESEC 2005HR @ 420șC bond temp. We were able to get very
good and stable die shear readings (3.5 CpK) with almost
100% silicon remain on all samples. We were advised by
demiGODS of the company that the standard "eutectic"
temp is 440șC, where did they get this?.
To what I know, eutectic temperature for Au-Si systems
(eutectic composition of 97.1 Wt % Au : 2.85 Wt % Si.)
is at 363șC only - is this correct? How about for gold
back only? Can someone clarify this issue and explain
how to get the right "eutectic temperature" based on
different die back metallizations.
Regards, |
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Posted by EE: Fri Jun
18, 2004 3:48 pm Post
subject: |
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Hi Iking Jr.,
There's nothing wrong with using a D/A temp of 420 deg C
if you're getting superior results from this temp. I've
seen some companies doing eutectic Au-Si D/A at a
temperature even lower than this, e.g., 410 deg C.
This is not to say, however, that you should refuse the
bosses' request to do it at 440 deg C. After all, this
is still data. Make a well-planned evaluation to compare
the outputs of the process at these two temps, and come
up with a good report stating your final recommendation.
EE |
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Posted by IkingJR: Mon
Jun 21, 2004 11:30 am Post
subject: |
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Dear EE;
Thanks. Actually our group is very confident that we can
operate below 440șC with superior result and we have
demonstrated that in our report. To further justify our
stand, can you recommend a known or standard reference
that we can use showing eutectic temp of different back
metallization types. Is there such a standard?
Best regards,
Eric |
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Posted by Newman: Sat
Sep 18, 2004 1:23 am Post
subject: |
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Hi
ALL,
Just to help AU-SI die attach temp can vary also
depending on the total time needed to bond all dies and
also on the inert gaz flow (if argon 90/10) and of
course if you perform or not the scrubbing when bonding
).
From 98 we were optimising the eutectic temp per type of
dice using using the non destructif testing SONOSCAN
Equipment and not the die-shear testing .
For sure the GOLD back side metallisation is impacting
the die-bonding integrity and quality.
We have modified more than 20 SPECS ""EUTECTIC TEMP""
depending on the % of voids and the electrical test
results .
RF power assembly engineer Morocco.
nbadidi@---
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Posted by Guest: Sun
Oct 23, 2005 10:55 am Post
subject: Re: Eutectic Temperature for various die back
metallizations |
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The temperature mentioned is given by customer. Its the
same on most of their packages around the subcon. Their
reason is in the variation of gold thickness at the
wafer back and this temperature as tested by them could
produce good result on this variation. |
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Posted by Sebastian:
Wed Nov 09, 2005 1:38 pm
Post subject: Re: Eutectic Temperature for various die
back metallizations |
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Some inputs too...
Are you doing eutectic DA on a hermetic package? PGA?
Side brazed? If not, nevermind this reply.
If so, you need to check not only the adhesion of the
die to the pad via die shear test, or what temperature
setting you have in your machine but also for loose
particles.
Hermetic packages have cavities (not molded) that these
loose materials (usually remnants of the Au/Si preform
during scrubbing) do not adhere much on the die pad.
During centrifuge test, these get detached and become
loose particles inside the cavity. You need to perform
PIND (particle induced noise detection) test to check
for these particles.
And these particles usally get "loose" because of higher
temperature setting and prolonged scrubbing time during
eutectice DA. |
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